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Single crystal MoO3 flakes grown on sapphire. Imaged in VINSE facilities using the Nikon Eclipse LV100 optical microscope.
Vanadium dioxide deposited on gold with the AJA ATC-2200 sputter tool and annealed in the MTI OTF-1200X 4" tube furnace, with irregular growth from the edge of the substrate. Imaged in VINSE facilities using the Nikon Eclipse LV100 microscope.
Close-up of Sharpie marker label on a Petri dish. Imaged in VINSE using the Olympus optical microscope.
Microscale droplets of photoresist formed during edge bead removal at a sample edge. Fabricated in the VINSE cleanroom and imaged with the Olympus optical microscope.
Silicon pillars etched in the Oxford PlasmaPro 100 Cobra ICP-RIE and covered with multiple conformal oxide layers using the Picosun R-200 Advanced ALD in the VINSE cleanroom. Imaged in VINSE Facilities using the FEI Tecnai G2 Osiris S/TEM.
Mega-sonicated MoS₂ flakes on SiO₂/Si with copper-hued edges showing aggregation. Imaged in the VINSE cleanroom using the Nikon Eclipse LV100 optical microscope.
Exfoliated MoO3 crystals on CaF2. Stacked using a custom built transfer tool while using the Nikon Eclipse LV100 microscope for imaging and alignment. Holes created using the FEI Helios NanoLab SEM/FIB.
Granular copper electroplated onto a silicon substrate using the Silicon Valley Wafer Plating: Immersion-Beaker-on-a-Stick System in the VINSE cleanroom. Imaged in VINSE facilities using the FEI Helios Nanolab SEM/FIB.
SiO₂ delaminated during etching after PECVD deposition in the VINSE cleanroom. Imaged in the VINSE facilities using the FEI Helios Nanolab SEM/FIB.
Samples mounted on a FIB grid for STEM analysis. Prepared in the VINSE facilities using the FEI Helios NanoLab FIB/SEM and FEI Tecnai G2 Osiris S/TEM.
Pile of alumina masks redeposited on a sample during a liftoff process. Fabricated in the VINSE cleanroom and imaged with the Olympus optical microscope.
Metal patterned with the Suss MA-6 mask aligner, DC sputtered with the AJA ATC-2200, and insulated by Parylene-C using the SCS Labcoter 3. Fabricated in the VINSE cleanroom.
Collection of photomasks created with the Heidelberg uPG 101 laser writer for the Suss MA6 mask aligner. Fabricated in the VINSE cleanroom.
Gallium nitride pillars etched due to SiO₂ micromasking. Imaged in the VINSE facilities using the FEI Helios Nanolab SEM/FIB.
Images of β-Ga₂O₃ on the VINSE Zeiss Merlin SEM.
Microelectrode through-hole composed of Parylene-C, platinum, and SU-8. Fabricated in the VINSE cleanroom.
Array of 42 metasurfaces, each with millions of nanostructures, producing vivid structural colors. Imaged in the VINSE facilities using the Olympus Optical Microscope.
Silicon dioxide patterned and etched to form porous structures. Imaged in the VINSE facilities using the FEI Helios Nanolab SEM/FIB.
Layered MoO3 exfoliated in the cleanroom, producing vivid iridescent colors, with a chromium mask deposited using the Angstrom Amod resistive deposition chamber and patterned using the Raith eLine EBL. Imaged with the Nikon Eclipse LV100 optical microscope.
Hand-drawn squirrel holding an acorn. Engraved using the VINSE Bruker Atomic Force Microscope.
Optical grating etched into Si using the Trion Minilock II reactive ion etcher. Fabricated in the VINSE cleanroom.